ORIGINS – Dr. Andrew Weil For Origins™ Mega-Mushroom Relief & Resilience Soothing Face Mask
INGRENDIENTS
Reishi Mushroom: Works over time to help strengthen skin.
-Chaga Mushroom: Calms redness.
-Coprinus Mushroom: Provides skin-protecting, anti-irritant, and antioxidant benefits.
-Probiotic Ferment: Helps balance the microbiomes of skin, which helps protect skin against inflammatory aggressors over time.
Water, Carthamus Tinctorius (Safflower) Seed Oil*, Butylene Glycol, Squalane, PEG-100 Stearate, Caprylic/Capric Triglyceride, Glyceryl Stearate, Tribehenin, Glycerin, Cetearyl Alcohol, Euphorbia Cerifera (Candelilla) Wax, Kaolin, Citrus Aurantium Dulcis (Orange) Oil** Lavandula Angustifolia (Lavender) Oil**, Pogostemon Cablin (Patchouli) Oil**, Citrus Nobilis (Mandarin Orange) Peel Oil**, Pelargonium Graveolens Flower Oil**, Boswellia Carterii (Olibanum) Oil ***, Limonene, Linalool, Citronellol, Geraniol, Citral, Ganoderma Lucidum (Reishi Mushroom) Extract, Fuscoporia Obliqua Sclerotium Extract, Cordyceps Sinensis (Mushroom) Extract, Ergothioneine, Camelina Sativa Seed Oil, Lactobacillus Ferment, Hippophae Rhamnoides Extract*, Zingiber Officinale (Ginger) Root Extract*, Ocimum Sanctum (Holy Basil) Leaf Extract, Curcuma Longa (Turmeric) Root Extract*, Olea Europaea (Olive) Leaf Extract, Silybum Marianum Fruit Extract, Persea Gratissima (Avocado) Fruit Extract, Ascophyllum Nodosum Extract, Sucrose*, Astrocaryum Murumuru Seed Butter, Asparagopsis Armata Extract, Yeast Extract, Cladosiphon Okamuranus Extract, Hypnea Musciformis (Algae) Extract, Behenyl Alcohol, Sorbitol, Trehalose, Adansonia Digitata Seed Oil, Caprylyl Glycol, Caffeine, Gellidiella Acerosa Extract, Calcium Carbonate, Helianthus Annuus (Sunflower) Seed Oil*, Polysorbate 20, Phytosterols, Maltodextrin Tocotrienols Phytosphingosine, Squalene, Saccharomyces Ferment Filtrate, Tocopherol, Sodium Hyaluronate, Potassium Hydroxide, Carbomer, Hexylene Glycol, Elaeis Guineensis (Palm) Oil, Dextrin, Phenoxyethanol, Iron Oxides (Ci 77491, Ci 77492, Ci 77499), Titanium Dioxide (Ci 77891).
#MASK2018
